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This work demonstrates a holistic approach that uses both circuit-level and architecture-level design techniques to improve low-voltage operation of SRAM. A simulation framework and experimental measurements from a 28nm testchip explore failure mechanisms of SRAM bitcells. The simulation framework is further utilized to evaluate the effectiveness of circuit-level SRAM assist techniques using dynamic failure metrics. New circuit-level techniques that use replica timing are developed to make SRAM macros more resilient to process variation. An architecture-level error model is developed to translate bitcell failure probability to yield, and to evaluate a variety of error-correcting code (ECC) and redundancy-based resiliency techniques. New resiliency schemes, named dynamic column redundancy (DCR) and bit bypass (BB), are proposed to tolerate a high bitcell failure rate with low overhead.
The methodology and proposed schemes were validated with five different 28nm chips. The RAVEN1 testchip measured in-situ threshold voltage variation of 30,000 bitcells and was used to analyze the effect of random telegraph noise on failures. The RAVEN2 testchip explored a single-p-well bitcell design that can compensate for global process variation. The RAVEN3 and RAVEN3.5 chips included processors with on-chip switched-capacitor voltage conversion, and resilient SRAM macros with circuit-level techniques that enable operation down to 0.45V. The SWERVE processor included architecture-level techniques to avoid failing cells, and decreases energy by over 30% with only 2% area overhead, and includes in-situ pipelined ECC to measure the contribution of intermittent SRAM error sources such as random telegraph noise and aging.
Overall, this dissertation describes a general methodology that is used to evaluate resilient design technique effectiveness for different process and architecture assumptions, and proposes a new set of resilient design techniques that lower the minimum operating voltage of caches with low overhead.